Intel passes one million High-NA EUV wafers, studies larger masks
Image: Primary Intel said it has processed more than one million 300-mm wafers on High-NA EUV scanners, including installation, certification, R&D and production work. The company certified the tools for its 18A process earlier this year and says they now make some Panther Lake processors. Intel is also working on 6×12-inch photomasks to avoid field stitching, though neither it nor ASML has confirmed whether existing or planned scanners can accommodate them.
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